#ALDALE2019 – A preview of my “ALD Innovator Award” plenary presentation at the 19th International Conference on Atomic Layer Deposition

The 19th International Conference on Atomic Layer Deposition, featuring also the 6th International Atomic Layer Etching Workshop, is about to start. It will kick-off today (Sunday July 22) with a tutorial session and the welcome reception. I feel extremely honored as I have been awarded the ALD Innovator Award this year. I highly appreciate this … Read more

Fully self-aligned vias: the killer application for area-selective ALD? – A discussion of the requirements for implementation in high volume manufacturing

Please cite as: A.J.M. Mackus, M.J.M. Merkx. Fully Self-Aligned Vias: The Killer Application for Area-Selective ALD? – A Discussion of the Requirements for Implementation in High Volume Manufacturing. 2019, 7. AtomicLimits. Recently, the 4th Area Selective Deposition workshop (ASD2019) took place at IMEC in Leuven, Belgium. During this workshop it became clear that the main … Read more

And here it is… the online ALD database
– A website where you can easily search, browse, and add ALD processes

Many of us ALD researchers have been talking – or even dreaming – about it for some years: an online database listing all ALD materials and processes. And now we have it! You can access it through the link at the top (or the menu on mobile devices) of the Atomic Limits blog. You can click … Read more

Reviews, reviews, reviews… and another one about ALD! – An update on the status and prospects of plasma ALD

Note: a list of ALD review papers is available at the end. Atomic layer deposition or ALD is amazingly popular these days and this is also reflected by the large number of review articles that have appeared over the recent years. The latter will be illustrated by an overview at the end of this blog, … Read more

Bridging academia and business – the heart of a successful collaboration in atomic scale processing

Fitting to the contents of this post on collaboration, this post will appear both on Atomic Limits and on the Oxford Instruments Plasma Technology blog. What defines a truly successful collaboration? It has to be something where the whole is greater than the sum. With the partnership between Oxford Instruments Plasma Technology and Eindhoven University … Read more

Atomic Layer Deposition Process Development
– 10 steps to successfully develop, optimize and characterize ALD recipes

Note: This post can also be downloaded at the bottom of this page. Please cite as: M.F.J. Vos, A.J.M. Mackus, W.M.M. Kessels. Atomic Layer Deposition Process Development – 10 steps to successfully develop, optimize and characterize ALD recipes. 2019, 3. AtomicLimits. Development of atomic layer deposition (ALD) processes, either to enable fabrication of new materials … Read more

Topographically selective processing
– Taking selectivity up a notch by processing in the 3rd dimension

Recently, the art of processing materials in a selective manner has garnered significant attention. Especially in the past few years, the topic of making atomic scale processing techniques, such as atomic layer deposition (ALD) and atomic layer etching (ALE), more selective has become a highly active field of research in both academia and industry.1–4 This … Read more

Overview of all materials prepared by atomic layer deposition (ALD)
– An up-to-date and colorful periodic table (to download)

As you might have noticed, we have just started a year in which we celebrate the discovery of the Periodic System by Dmitri Mendeleev: 2019 is the 150th anniversary of the Periodic Table of Chemical Elements and has therefore been proclaimed the “International Year of the Periodic Table of Chemical Elements (IYPT2019)” by the United Nations … Read more

Towards Area-Selective Atomic Layer Deposition with High Selectivity
– Our perspective on area-selective ALD

We just published a perspective article entitled “From the bottom-up: towards area-selective atomic layer deposition with high selectivity”.1 This perspective describes the current status of the field of area-selective atomic layer deposition (ALD), and also includes my vision on how we can improve the selectivity. It is published in Chemistry of Materials as part of … Read more

Where do our students and postdocs go? Mainly to ASML?
– About the alumni of the Plasma & Materials Processing research group

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When evaluating what comes out of a university research group, often the research carried out by the group is given most attention. However, obviously, the most important product of a research group is not the research itself but it’s the people that are educated and trained: our students and postdocs. This blog post is somewhat … Read more

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