Note: This post can also be downloaded at the bottom of this page. Please cite as: M.F.J. Vos, A.J.M. Mackus, W.M.M. Kessels. Atomic Layer Deposition Process Development – 10 steps to successfully develop, optimize and characterize ALD recipes. 2019, 3.
Eindhoven, the Netherlands
I am a doctoral researcher at the Eindhoven University of Technology, working in the Plasma & Materials Processing group. My research is focused on the development and study of challenging atomic layer deposition processes, as well as area-selective ALD.