Martijn Vos

I am a doctoral researcher at the Eindhoven University of Technology, working in the Plasma & Materials Processing group. My research is focused on the development and study of challenging atomic layer deposition processes, as well as area-selective ALD.

Atomic Layer Deposition Process Development
– 10 steps to successfully develop, optimize and characterize ALD recipes

Note: This post can also be downloaded at the bottom of this page. Please cite as: M.F.J. Vos, A.J.M. Mackus, W.M.M. Kessels. Atomic Layer Deposition Process Development – 10 steps to successfully develop, optimize and characterize ALD recipes. 2019, 3. AtomicLimits. Development of atomic layer deposition (ALD) processes, either to enable fabrication of new materials … Read more

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