At the end of July the annual AVS International Conference on Atomic Layer Deposition (ALD) – combined with the Atomic Layer Etching (ALE) Workshop – took place in Bellevue, Seattle. As customary, the Sunday before the conference itself was devoted to
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#ALDALE2019: the aftermath… including photos!
The photos in this blog post were made by DIWAS Photography, Seattle Event Photographer Two weeks ago the 19th International Conference on Atomic Layer Deposition, featuring also the 6th International Atomic Layer Etching Workshop, took place in Bellevue, WA. As
Here we go again… the online ALE database! – A website where you can easily search, find, and add ALE processes
It might not be fully unexpected but after launching our online ALD database a few months ago, but now we have now also put together an online database on Atomic Layer Etching (ALE). So here it is! Similar to the
#ALDALE2019 – A preview of my “ALD Innovator Award” plenary presentation at the 19th International Conference on Atomic Layer Deposition
The 19th International Conference on Atomic Layer Deposition, featuring also the 6th International Atomic Layer Etching Workshop, is about to start. It will kick-off today (Sunday July 22) with a tutorial session and the welcome reception. I feel extremely honored
Fully self-aligned vias: the killer application for area-selective ALD? – A discussion of the requirements for implementation in high volume manufacturing
Adrie Mackus, Marc Merkx Recently, the 4th Area Selective Deposition workshop (ASD2019) took place at IMEC in Leuven, Belgium. During this workshop it became clear that the main application the semiconductor industry is currently looking at for area-selective atomic layer
And here it is… the online ALD database
– A website where you can easily search, browse, and add ALD processes
Many of us ALD researchers have been talking – or even dreaming – about it for some years: an online database listing all ALD materials and processes. And now we have it! You can access it through the link at
Reviews, reviews, reviews… and another one about ALD! – An update on the status and prospects of plasma ALD
Note: a list of ALD review papers is available at the end. Atomic layer deposition or ALD is amazingly popular these days and this is also reflected by the large number of review articles that have appeared over the recent
Bridging academia and business – the heart of a successful collaboration in atomic scale processing
Fitting to the contents of this post on collaboration, this post will appear both on Atomic Limits and on the Oxford Instruments Plasma Technology blog. What defines a truly successful collaboration? It has to be something where the whole is
Atomic Layer Deposition Process Development
– 10 steps to successfully develop, optimize and characterize ALD recipes
Note: This post can also be downloaded at the bottom of this page. Development of atomic layer deposition (ALD) processes, either to enable fabrication of new materials by ALD, as well as to improve existing ALD materials, is an ongoing
Topographically selective processing
– Taking selectivity up a notch by processing in the 3rd dimension
Recently, the art of processing materials in a selective manner has garnered significant attention. Especially in the past few years, the topic of making atomic scale processing techniques, such as atomic layer deposition (ALD) and atomic layer etching (ALE), more