As a prelude to our upcoming workshop on atomic layer deposition and etching for quantum technologies, we share our vision in this blog post about how ALD and ALE can help propel quantum technologies forward. Also, a detailed program and
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Advancing Thin Film Metrology in 3D Structures: The Benefits of the PillarHall Concept
This is a blogpost initiated by our sponsor Chipmetrics The rapid advancement of nanoelectronics is driving the transition to 3D vertical scaling, requiring ultra-thin, highly conformal films to be deposited within high-aspect ratio (HAR) structures. As these technological advances push
Save the Date & Register Now: Second Edition of the Spatial ALD Day – October 28, 2025
We are excited to announce the second edition of the Spatial ALD Day, which will take place on Tuesday, October 28, 2025! This event follows the highly successful first Spatial ALD Day we organized at the start of our NWO
Atomic layer deposition and etching for quantum technologies: Workshop on the 20th of May 2025!
On the 20th of May 2025, a full day event will be organized at the Eindhoven University of Technology focusing on the opportunities that atomic layer deposition (ALD) and atomic layer etching (ALE) provide for quantum technologies. A preliminary program
Passivating Contacts for Silicon Solar Cells: A Zinc Oxide Breakthrough?
In the field of silicon solar cells, the search for more efficient and cost-effective technologies never ceases. One of the most exciting developments of the past decade has been the rise of so-called passivating contacts, with the current industry leader
Surface passivation as a cornerstone of modern semiconductor technology – Highlighting a comprehensive review paper on surface passivation for silicon, germanium, and III–V materials
What do transistors, solar cells, microLEDs, and thin-film transistors have in common? At first glance, the answer might seem straightforward: they all rely on semiconductor materials such as silicon (Si), germanium (Ge), gallium arsenide (GaAs), indium phosphide (InP), and gallium
Celebrating the 50th anniversary of ALD at ALD/ALE 2024 in Helsinki! – Updates of the history of ALD in timelines and the animated version of the ALD periodic table
Next week, from August 4 to 7, the ALD/ALE 2024 conference will be held in Helsinki, Finland. This event marks the 24th International Conference on Atomic Layer Deposition and will also include the 11th International Atomic Layer Etching Workshop. This
Atomic Limits company talk: AlixLabs – Atomic Layer Etching for Nano Device Fabrication
“An interview with Jonas Sundqvist” This is the sixth post in a series of blogs in which we share exciting information about companies or other organizations within the atomic scale processing industry. Through an interview, we aim to get insight
AI serving the ALD community – Using ChatGPT 4 to extract ALD parameters from scientific papers
Recently, the Plasma and Materials Processing (PMP) group at the TU/e hosted de AI workshop, a company founded by four students that aims to educate and train people about using Artificial Intelligence (AI) for their work, especially ChatGPT 4. The
Introducing the new AtomicLimits ReviewBase – New features, new design and more to come!
We are very excited to announce the release of the totally renewed ReviewBase, which you can find in the menu above. We launched the original ReviewBase in 2022 as an easy-to-access overview of ALD, ALE and ASD review papers and