It is more than 2 years ago that Elsa Alvaro (Northwestern University Libraries) and Angel Yanguas-Gil (Argonne National Laboratory) published their research article “Characterizing the field of Atomic Layer Deposition: Authors, topics, and collaborations” in PLOS ONE. This article provided
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#ALDALE2020 – The prime conference in the field of atomic scale processing brought to your home
One of the most exciting presentations I saw in last year was given by Rajesh Krishnamurthy, a senior technology analyst of TechInsights. He was invited at the 19th International Conference on Atomic Layer Deposition in Bellevue WA, which also featured
ALD in the Netherlands – Special issue of the NEVAC magazine (free): How a small country can be big in nanolayers
The Dutch Vacuum Society – or Nederlandse Vacuümvereniging (NEVAC) – publishes the so-called “NEVAC blad”, a magazine that appears three times a year. The issue for June 2020 just appeared and it is a special issue completely devoted to atomic
Atomic layer etching turns 32.5 years old! – A good occasion to share an ALE timeline and an animated version of the ALE periodic table
Last November the method of atomic layer deposition (ALD) turned 45 years old. The date of November 29, 1974 was the priority date for the first patent in the field of ALD. I considered this a good occasion to share
Basic insights into ALD conformality – A closer look at ALD and thin film conformality
Note: This post can also be downloaded at the bottom of this page. Please cite as: K. Arts, W.M.M. Kessels and H.C.M Knoops. Basic insights into ALD conformality – A closer look at ALD and thin film conformality. 2020, 1.
The ALD/Database: looking back on the first year
Precursor naming schemes: what’s in a name? When submitting a new process we ask the contributors to describe the material and the reactants (including precursors). This also means that we are “forced” to use 1 coherent naming scheme for molecules.
Atomic layer deposition turns 45! – The history of ALD in a timeline and an animated version of the ALD periodic table
Atomic layer deposition (ALD) has become a very popular method for the preparation of (ultra)thin films over the last two decades, yet it has a rich history which goes back many more years. It is well known that the first
Plasma ALD – A discussion of mechanisms – Commemorating the career of John Coburn
Undoubtedly, every scientist and technologist working in the field of plasma etching has heard about the research carried out by Coburn and Winters, two research scientists that worked at the IBM San Jose Research Laboratory for almost their full professional
What can Atomic Layer Deposition do for solar cells? – A few afterthoughts from my ALD conference tutorial
At the end of July the annual AVS International Conference on Atomic Layer Deposition (ALD) – combined with the Atomic Layer Etching (ALE) Workshop – took place in Bellevue, Seattle. As customary, the Sunday before the conference itself was devoted to
#ALDALE2019: the aftermath… including photos!
The photos in this blog post were made by DIWAS Photography, Seattle Event Photographer Two weeks ago the 19th International Conference on Atomic Layer Deposition, featuring also the 6th International Atomic Layer Etching Workshop, took place in Bellevue, WA. As