On June 9th 2022, we will organize a spatial ALD day at the Eindhoven University of Technology. This full-day event will cover various aspects of spatial ALD, including presentations by spatial ALD companies in the Netherlands, as well as overview
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Area-selective ALD of diffusion barriers for via optimization – There is plenty of room at the bottom
Please cite as M.J.M. Merkx, A.J.M. Mackus, Area-selective ALD of diffusion barriers for via optimization – There is plenty of room at the bottom. 2022, 7. AtomicLimits. This week the 6th area-selective deposition (ASD) workshop will be held in San Francisco,
Launch of the ALD & ALE ReviewBase – An easy-to-access overview of all ALD and ALE review papers
The scientific and technological interest in atomic layer deposition (ALD) and atomic layer etching (ALE) has been surging in the last decade and the sheer volume of ALD and ALE papers can make it difficult to get a clear overview
Atomic Limits company talk: SALD and their spatial ALD business
An interview with Bas van de Loo and Peter Visser This is the start of a new series of blog posts in which we will share exciting information about companies or other organizations within the atomic scale processing industry. By
Atomic Layer Etch Carves the Path to More Efficient Computing
Abstract High-volume manufacturing (HVM) of atomic-scale semiconductor devices requires new approaches to deposit and etch materials in complex nano-architectures. Next-generation logic devices, including gate all-around (GAA) transistors and the conductors that link them together, must be engineered with atomic precision.
ALD from an application perspective – An upcoming AVS webinar
On February 9, 2022 (1:00 pm – 5:00 pm (EDT) I will give my second AVS Webinar. Last year I gave a webinar about the topic “Plasma-Assisted Atomic Layer Deposition: From Basics to Applications” and this year the topic is
Metal-on-metal area-selective deposition-Why cobalt succeeded where tungsten failed
In 2019 we wrote a blog post on the use of area-selective deposition (ASD) for the fabrication of Fully Self-Aligned Via (FSAV) structures and how this application could enable further downscaling in the semiconductor industry.
About (my way of) academic leadership
-A reflection after 10 years of chairing the Plasma & Materials Processing group at TU/e
In 2021 it was 10 years ago that I took over the chair position of the Plasma & Materials Processing (PMP) group at the Department of Applied Physics of the Eindhoven University of Technology (TU/e). Since then I have been
Students in plasma processing
A sneak peek into the real world – part II: the student perspective
How a master course can provide insights into real-life industrial challenges In the previous blog on the master course “plasma processing science and technology” given at the Eindhoven University of Technology, a nice and concise explanation about the goal and
Unravelling complex nanoelectronic devices
A challenge-based learning assignment – part I: the teacher perspective
With the new academic year just started, this blogpost focuses on teaching, and describes the assignment we designed as part of a course on plasma processing. The inspiration for this assignment is that we all are accustomed to the marvels