***Quick link to the open access paper: “Foundations of atomic-level plasma processing in nanoelectronics”*** We have just published a topical review paper entitled “Foundations of atomic-level plasma processing in nanoelectronics” in the journal Plasma Sources Science and Technology. This review
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AtomicLimits company talk: SparkNano and their aim to commercialize spatial ALD for the energy market
Cover image: SparkNano engineers in the lab (courtesy of TNO) An interview with Huib Heezen and Paul Poodt This is the second post in a new series of blogs in which we will share exciting information about companies or other organizations
Looking back at the Spatial ALD day -with photos and downloadable presentations!
At the start of summer we hosted the first Spatial ALD day at the Eindhoven University of Technology. In this blogpost, I want to look back at this day with a few highlights. Also, you can find photos and downloadable
ALD and ALE go Quantum –Research grant for scalable atomic scale processing (ASP) techniques for quantum computing
Recently, the Dutch Research Council (NWO) revealed six research projects to receive funding within its Open Technology Programme. We are proud to announce that our project – Atomic Layer Deposition and Etching for Quantum Computing – is among these projects!
Update of the Atomic Scale Processing ReviewBase – Easy-to-access overview of ALD and ALE reviews (extended), ASD reviews (new) and ALD book chapters (new)
In late March, we launched our ReviewBase, a listing of atomic layer deposition (ALD) and atomic layer etching (ALE) review articles. The ReviewBase files available in Excel and PDF formats have been downloaded more than 500 times altogether in a
Area-selective ALD of diffusion barriers for via optimization – There is plenty of room at the bottom
Please cite as M.J.M. Merkx, A.J.M. Mackus, Area-selective ALD of diffusion barriers for via optimization – There is plenty of room at the bottom. 2022, 7. AtomicLimits. This week the 6th area-selective deposition (ASD) workshop will be held in San Francisco,
Spatial ALD day – June 9th, register here!
On June 9th 2022, we will organize a spatial ALD day at the Eindhoven University of Technology. This full-day on-site (not online!) event will cover various aspects of spatial ALD, including presentations by spatial ALD companies in the Netherlands, as
Launch of the ALD & ALE ReviewBase – An easy-to-access overview of all ALD and ALE review papers
The scientific and technological interest in atomic layer deposition (ALD) and atomic layer etching (ALE) has been surging in the last decade and the sheer volume of ALD and ALE papers can make it difficult to get a clear overview
Atomic Limits company talk: SALD and their spatial ALD business
An interview with Bas van de Loo and Peter Visser This is the start of a new series of blog posts in which we will share exciting information about companies or other organizations within the atomic scale processing industry. By
Atomic Layer Etch Carves the Path to More Efficient Computing
Abstract High-volume manufacturing (HVM) of atomic-scale semiconductor devices requires new approaches to deposit and etch materials in complex nano-architectures. Next-generation logic devices, including gate all-around (GAA) transistors and the conductors that link them together, must be engineered with atomic precision.