Last November the method of atomic layer deposition (ALD) turned 45 years old. The date of November 29, 1974 was the priority date for the first patent in the field of ALD. I considered this a good occasion to share
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Note: This post can also be downloaded at the bottom of this page. Please cite as: K. Arts, W.M.M. Kessels and H.C.M Knoops. Basic insights into ALD conformality – A closer look at ALD and thin film conformality. 2020, 1.
Precursor naming schemes: what’s in a name? When submitting a new process we ask the contributors to describe the material and the reactants (including precursors). This also means that we are “forced” to use 1 coherent naming scheme for molecules.
Atomic layer deposition (ALD) has become a very popular method for the preparation of (ultra)thin films over the last two decades, yet it has a rich history which goes back many more years. It is well known that the first
Undoubtedly, every scientist and technologist working in the field of plasma etching has heard about the research carried out by Coburn and Winters, two research scientists that worked at the IBM San Jose Research Laboratory for almost their full professional
At the end of July the annual AVS International Conference on Atomic Layer Deposition (ALD) – combined with the Atomic Layer Etching (ALE) Workshop – took place in Bellevue, Seattle. As customary, the Sunday before the conference itself was devoted to
The photos in this blog post were made by DIWAS Photography, Seattle Event Photographer Two weeks ago the 19th International Conference on Atomic Layer Deposition, featuring also the 6th International Atomic Layer Etching Workshop, took place in Bellevue, WA. As
It might not be fully unexpected but after launching our online ALD database a few months ago, but now we have now also put together an online database on Atomic Layer Etching (ALE). So here it is! Similar to the
The 19th International Conference on Atomic Layer Deposition, featuring also the 6th International Atomic Layer Etching Workshop, is about to start. It will kick-off today (Sunday July 22) with a tutorial session and the welcome reception. I feel extremely honored
Please cite as: A.J.M. Mackus, M.J.M. Merkx. Fully Self-Aligned Vias: The Killer Application for Area-Selective ALD? – A Discussion of the Requirements for Implementation in High Volume Manufacturing. 2019, 7. AtomicLimits. Recently, the 4th Area Selective Deposition workshop (ASD2019) took