One of the most exciting presentations I saw in last year was given by Rajesh Krishnamurthy, a senior technology analyst of TechInsights. He was invited at the 19th International Conference on Atomic Layer Deposition in Bellevue WA, which also featured the 6th International Atomic Layer Etching Workshop. During this ALD/ALE 2019 meeting (which I covered … Read more
The Dutch Vacuum Society – or Nederlandse Vacuümvereniging (NEVAC) – publishes the so-called “NEVAC blad”, a magazine that appears three times a year. The issue for June 2020 just appeared and it is a special issue completely devoted to atomic layer deposition (ALD). Together with my colleague Bart Macco, I was the guest editor. Originally … Read more
Last November the method of atomic layer deposition (ALD) turned 45 years old. The date of November 29, 1974 was the priority date for the first patent in the field of ALD. I considered this a good occasion to share an ALD timeline and animated version of the ALD periodic table on this blog. The … Read more
Note: This post can also be downloaded at the bottom of this page. Please cite as: K. Arts, W.M.M. Kessels and H.C.M Knoops. Basic insights into ALD conformality – A closer look at ALD and thin film conformality. 2020, 1. AtomicLimits. Investigating the conformality of thin films grown by atomic layer deposition (ALD) is not … Read more
Introduction In March 2019 the ALD/Database was introduced to the ALD community on www.atomiclimits.com. The ALD/Database is an initiative by Harm Knoops, Bart Macco, Vincent Vandalon and Erwin Kessels and offers a centralized platform for the ALD community to provide an overview of papers reporting on ALD processes and their characteristics. New papers can be … Read more
Atomic layer deposition (ALD) has become a very popular method for the preparation of (ultra)thin films over the last two decades, yet it has a rich history which goes back many more years. It is well known that the first patent on ALD was applied for in 1974 [1]. The priority date was November 29, … Read more
Undoubtedly, every scientist and technologist working in the field of plasma etching has heard about the research carried out by Coburn and Winters, two research scientists that worked at the IBM San Jose Research Laboratory for almost their full professional career. In 2016 Harold Winters, at the age of 83, sadly passed away and this … Read more
At the end of July the annual AVS International Conference on Atomic Layer Deposition (ALD) – combined with the Atomic Layer Etching (ALE) Workshop – took place in Bellevue, Seattle. As customary, the Sunday before the conference itself was devoted to tutorials, each about 45 minutes long. In previous years the focus was mainly on fundamentals … Read more
The photos in this blog post were made by DIWAS Photography, Seattle Event Photographer Two weeks ago the 19th International Conference on Atomic Layer Deposition, featuring also the 6th International Atomic Layer Etching Workshop, took place in Bellevue, WA. As always, it was a very intense conference with an extremely full program packed in 3.5 … Read more
It might not be fully unexpected but after launching our online ALD database a few months ago, but now we have now also put together an online database on Atomic Layer Etching (ALE). So here it is! Similar to the ALD database, you can also access it through a link at the top of the … Read more