In 2019 we wrote a blog post on the use of area-selective deposition (ASD) for the fabrication of Fully Self-Aligned Via (FSAV) structures and how this application could enable further downscaling in the semiconductor industry.
Unravelling complex nanoelectronic devices
A challenge-based learning assignment – part I: the teacher perspective
With the new academic year just started, this blogpost focuses on teaching, and describes the assignment we designed as part of a course on plasma processing. The inspiration for this assignment is that we all are accustomed to the marvels
Control of the ion energy during plasma-based atomic-scale processing – animation and publication on tailored waveform biasing
This post is about the value of industry-academia partnerships, and about how such collaborations can trigger new innovations. This month exactly 3 years ago, we were approached by Prodrive Technologies, a company in the Eindhoven area developing and manufacturing electronics
Fully self-aligned vias: the killer application for area-selective ALD? – A discussion of the requirements for implementation in high volume manufacturing
Please cite as: A.J.M. Mackus, M.J.M. Merkx. Fully Self-Aligned Vias: The Killer Application for Area-Selective ALD? – A Discussion of the Requirements for Implementation in High Volume Manufacturing. 2019, 7. AtomicLimits. Recently, the 4th Area Selective Deposition workshop (ASD2019) took
Towards Area-Selective Atomic Layer Deposition with High Selectivity
– Our perspective on area-selective ALD
We just published a perspective article entitled “From the bottom-up: towards area-selective atomic layer deposition with high selectivity”.1 This perspective describes the current status of the field of area-selective atomic layer deposition (ALD), and also includes my vision on how
Stop motion movie of a novel area-selective ALD approach
– Building a film with nanoblocks – literally!
As will be clear from many of our posts on this blog(1, 2, 3), area-selective deposition (ASD) is currently an extremely hot research topic. This is mainly because of its potential application in future nanoelectronics as a solution to the
New developments in area selective deposition
– Take-home messages from the 2nd Area Selective Deposition workshop (ASD2017)
As announced in our previous blog post on the 2nd area selective deposition (ASD2017) workshop, this post will highlight the new developments in the field of ASD. I will summarize my take-home messages from the workshop by discussing three topics
2nd Area-selective deposition workshop (ASD 2017)
– Flashback
On April 20-21, the 2nd Area Selective Deposition workshop (ASD 2017) took place in Eindhoven. Here we give a brief flashback of the workshop and include several photographs of the meeting, including a group photo of the participants. The workshop