Please cite as: A.J.M. Mackus, M.J.M. Merkx. Fully Self-Aligned Vias: The Killer Application for Area-Selective ALD? – A Discussion of the Requirements for Implementation in High Volume Manufacturing. 2019, 7. AtomicLimits. Recently, the 4th Area Selective Deposition workshop (ASD2019) took
The dawn of atomic-scale processing
– The growing importance of atomic layer deposition and etching
A few weeks ago, the big news was that the research alliance of IBM, Global Foundries and Samsung unveiled the world’s first 5 nm chip as we could all read everywhere over the internet [1]. Most notable was however the