Recently, the Dutch Research Council (NWO) revealed six research projects to receive funding within its Open Technology Programme. We are proud to announce that our project – Atomic Layer Deposition and Etching for Quantum Computing – is among these projects!
Please cite as: A.J.M. Mackus, M.J.M. Merkx. Fully Self-Aligned Vias: The Killer Application for Area-Selective ALD? – A Discussion of the Requirements for Implementation in High Volume Manufacturing. 2019, 7. AtomicLimits. Recently, the 4th Area Selective Deposition workshop (ASD2019) took
A few weeks ago, the big news was that the research alliance of IBM, Global Foundries and Samsung unveiled the world’s first 5 nm chip as we could all read everywhere over the internet . Most notable was however the