Tahsin Faraz

Tahsin is a doctoral researcher in Applied Physics at the Eindhoven University of Technology, where he works on atomic scale processing techniques for applications in nanoelectronics. His research mostly focuses on the role of plasma-matter interactions during materials deposition and etching. He is the recipient of the 2018 John Coburn and Harold Winters award, given by the Plasma Science and Technology Division of the American Vacuum Society (AVS) in recognition of outstanding original research in the field of plasma science.

Topographically selective processing
– Taking selectivity up a notch by processing in the 3rd dimension

Recently, the art of processing materials in a selective manner has garnered significant attention. Especially in the past few years, the topic of making atomic scale processing techniques, such as atomic layer deposition (ALD) and atomic layer etching (ALE), more selective has become a highly active field of research in both academia and industry.1–4 This … Read more

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