Last year we finished a project called “Taking plasma ALD to the next level” (funded by the Netherlands Organization for Scientific Research (NWO), Applied and Engineering Sciences (AES) section). This project was devoted to obtaining a better understanding of plasma
After enabling AI it is time for the plasma community to benefit from AI – Personal view in a short perspective article
This blog post is about a short perspective article that I recently wrote for the ILTPC newsletter. ILTPC stands for the International Low Temperature Plasma Community. It is one of the two main communities where I feel at home. The
Plasma-Assisted Atomic Layer Deposition: Basics, Equipment, Applications – An upcoming AVS webinar – February 15, 2023
On February 15, 2023 (1:00 pm – 5:00 pm (EDT) I will give an AVS Webinar about the topic plasma-assisted ALD. I gave a similar webinar two years ago and you can read about it here as it was covered
Let’s chat GPC by chatGPT – Putting ChatGPT to the test and a first (?) article about ALD by AI
I’m sure you have heard the buzz in the field of artificial intelligence (AI)… The promise of AI is to augment human abilities in areas such as decision-making, problem-solving, and other tasks. AI systems aim to simulate human intelligence and
Foundations of atomic-level plasma processing in nanoelectronics – Smaller, thinner, taller, etc … all enabled by plasmas
***Quick link to the open access paper: “Foundations of atomic-level plasma processing in nanoelectronics”*** We have just published a topical review paper entitled “Foundations of atomic-level plasma processing in nanoelectronics” in the journal Plasma Sources Science and Technology. This review
ALD and ALE go Quantum –Research grant for scalable atomic scale processing (ASP) techniques for quantum computing
Recently, the Dutch Research Council (NWO) revealed six research projects to receive funding within its Open Technology Programme. We are proud to announce that our project – Atomic Layer Deposition and Etching for Quantum Computing – is among these projects!
Launch of the ALD & ALE ReviewBase – An easy-to-access overview of all ALD and ALE review papers
The scientific and technological interest in atomic layer deposition (ALD) and atomic layer etching (ALE) has been surging in the last decade and the sheer volume of ALD and ALE papers can make it difficult to get a clear overview
ALD from an application perspective – An upcoming AVS webinar
On February 9, 2022 (1:00 pm – 5:00 pm (EDT) I will give my second AVS Webinar. Last year I gave a webinar about the topic “Plasma-Assisted Atomic Layer Deposition: From Basics to Applications” and this year the topic is
About (my way of) academic leadership
-A reflection after 10 years of chairing the Plasma & Materials Processing group at TU/e
In 2021 it was 10 years ago that I took over the chair position of the Plasma & Materials Processing (PMP) group at the Department of Applied Physics of the Eindhoven University of Technology (TU/e). Since then I have been
Visualizing the contributions of key authors to the field of ALD – Exploring newly implemented functionality of the ALD/Database
It is more than 2 years ago that Elsa Alvaro (Northwestern University Libraries) and Angel Yanguas-Gil (Argonne National Laboratory) published their research article “Characterizing the field of Atomic Layer Deposition: Authors, topics, and collaborations” in PLOS ONE. This article provided