This blog post is about a short perspective article that I recently wrote for the ILTPC newsletter. ILTPC stands for the International Low Temperature Plasma Community. It is one of the two main communities where I feel at home. The
Let’s chat GPC by chatGPT – Putting ChatGPT to the test and a first (?) article about ALD by AI
I’m sure you have heard the buzz in the field of artificial intelligence (AI)… The promise of AI is to augment human abilities in areas such as decision-making, problem-solving, and other tasks. AI systems aim to simulate human intelligence and
A review on Atomic Layer Deposition of (semi)conductive oxides – The role of ALD in these emerging materials and their applications
Quick link to open access paper: Applied Physics Reviews 9, 041313 (2022) Earlier this month I published my review paper entitled Atomic layer deposition of conductive and semiconductive oxides. It was an invited review for Applied Physics Reviews and I was
Foundations of atomic-level plasma processing in nanoelectronics – Smaller, thinner, taller, etc … all enabled by plasmas
***Quick link to the open access paper: “Foundations of atomic-level plasma processing in nanoelectronics”*** We have just published a topical review paper entitled “Foundations of atomic-level plasma processing in nanoelectronics” in the journal Plasma Sources Science and Technology. This review
Update of the Atomic Scale Processing ReviewBase – Easy-to-access overview of ALD and ALE reviews (extended), ASD reviews (new) and ALD book chapters (new)
In late March, we launched our ReviewBase, a listing of atomic layer deposition (ALD) and atomic layer etching (ALE) review articles. The ReviewBase files available in Excel and PDF formats have been downloaded more than 500 times altogether in a
Launch of the ALD & ALE ReviewBase – An easy-to-access overview of all ALD and ALE review papers
The scientific and technological interest in atomic layer deposition (ALD) and atomic layer etching (ALE) has been surging in the last decade and the sheer volume of ALD and ALE papers can make it difficult to get a clear overview
Conformal deposition and gap-fill by plasma ALD – some great TEM images and recently published cover art
The ability of atomic layer deposition (ALD) to grow highly conformal thin films is one of the main reasons why ALD is so popular in research and heavily employed in the semiconductor industry.1,2 This not only holds for thermally-driven ALD.
Diving into the Fundamentals of Spatial Atomic Layer Deposition – Strengthening the S-ALD hub in Brainport region Eindhoven
On May 1st, we kicked off our new research project entitled “Spatial Atomic Layer Deposition – More Materials, More Demanding Applications” , granted by the NWO Domain Applied and Engineering Sciences. As the title suggests, the project is geared at
A new flavor of ALE – What plasmas can bring to isotropic etching (a radical approach)
Plasmas can offer more than just etching straight down. This blog post aims to show that the etching community can benefit greatly from using plasmas for new applications. Currently, in the atomic layer etching (ALE) community plasmas are often considered
Control of the ion energy during plasma-based atomic-scale processing – animation and publication on tailored waveform biasing
This post is about the value of industry-academia partnerships, and about how such collaborations can trigger new innovations. This month exactly 3 years ago, we were approached by Prodrive Technologies, a company in the Eindhoven area developing and manufacturing electronics