Recently, the Dutch Research Council (NWO) revealed six research projects to receive funding within its Open Technology Programme. We are proud to announce that our project – Atomic Layer Deposition and Etching for Quantum Computing – is among these projects!
The scientific and technological interest in atomic layer deposition (ALD) and atomic layer etching (ALE) has been surging in the last decade and the sheer volume of ALD and ALE papers can make it difficult to get a clear overview
Note: a list of ALD review papers is available at the end. Atomic layer deposition or ALD is amazingly popular these days and this is also reflected by the large number of review articles that have appeared over the recent
Fitting to the contents of this post on collaboration, this post will appear both on Atomic Limits and on the Oxford Instruments Plasma Technology blog. What defines a truly successful collaboration? It has to be something where the whole is