ALD and ALE go Quantum — Research grant for scalable atomic scale processing (ASP) techniques for quantum computing

Recently, the Dutch Research Council (NWO) revealed six research projects to receive funding within its Open Technology Programme. We are proud to announce that our project – Atomic Layer Deposition and Etching for Quantum Computing – is among these projects! In this blog we will outline why this project was conceived, and why the addition … Read more

Launch of the ALD & ALE ReviewBase – An easy-to-access overview of all ALD and ALE review papers

The scientific and technological interest in atomic layer deposition (ALD) and atomic layer etching (ALE) has been surging in the last decade and the sheer volume of ALD and ALE papers can make it difficult to get a clear overview of what is going on. Luckily, the studies and trends are often summarized and compared … Read more

Reviews, reviews, reviews… and another one about ALD! – An update on the status and prospects of plasma ALD

Note: a list of ALD review papers is available at the end. Atomic layer deposition or ALD is amazingly popular these days and this is also reflected by the large number of review articles that have appeared over the recent years. The latter will be illustrated by an overview at the end of this blog, … Read more

Bridging academia and business – the heart of a successful collaboration in atomic scale processing

Fitting to the contents of this post on collaboration, this post will appear both on Atomic Limits and on the Oxford Instruments Plasma Technology blog. What defines a truly successful collaboration? It has to be something where the whole is greater than the sum. With the partnership between Oxford Instruments Plasma Technology and Eindhoven University … Read more

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