Vincent Vandalon 
Key findings: ALD/Database continued to grow in 2020 by 323 new entries reaching 4527 entries in total. In 2020, we saw the introduction of: 123 new ALD processes, 20 new precursors, 17 new materials. Trending: most new ALD process go beyond AB-style processes, e.g. for ternary materials. Catch-up effect seen in first year (2019) subsided, … Read more
It is more than 2 years ago that Elsa Alvaro (Northwestern University Libraries) and Angel Yanguas-Gil (Argonne National Laboratory) published their research article “Characterizing the field of Atomic Layer Deposition: Authors, topics, and collaborations” in PLOS ONE. This article provided some interesting insights into how the method of ALD evolved over time while the field … Read more
Introduction In March 2019 the ALD/Database was introduced to the ALD community on www.atomiclimits.com. The ALD/Database is an initiative by Harm Knoops, Bart Macco, Vincent Vandalon and Erwin Kessels and offers a centralized platform for the ALD community to provide an overview of papers reporting on ALD processes and their characteristics. New papers can be … Read more
When evaluating what comes out of a university research group, often the research carried out by the group is given most attention. However, obviously, the most important product of a research group is not the research itself but it’s the people that are educated and trained: our students and postdocs. This blog post is somewhat … Read more