As you might have noticed, we have just started a year in which we celebrate the discovery of the Periodic System by Dmitri Mendeleev: 2019 is the 150th anniversary of the Periodic Table of Chemical Elements and has therefore been
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We just published a perspective article entitled “From the bottom-up: towards area-selective atomic layer deposition with high selectivity”.1 This perspective describes the current status of the field of area-selective atomic layer deposition (ALD), and also includes my vision on how
I recently successfully defended my PhD thesis, entitled “Atomic Layer Deposition of Metal Oxide Thin Films for Si Heterojunction Solar Cells”. As the title suggests, I have worked on ALD of various metal oxides for the application in Si heterojunction
Many of us ALD researchers have been talking – or even dreaming – about it for some years: an online database listing all ALD materials and processes. And now we have it! You can access it through the link at
Note: a list of ALD review papers is available at the end. Atomic layer deposition or ALD is amazingly popular these days and this is also reflected by the large number of review articles that have appeared over the recent
Note: This post can also be downloaded at the bottom of this page. Please cite as: K. Arts, W.M.M. Kessels and H.C.M Knoops. Basic insights into ALD conformality – A closer look at ALD and thin film conformality. 2020, 1.
Serendipity is often cited as a key factor in scientific innovations. I can fully confirm this as will also be obvious from the subtitle of this blog site: “Blog about strategy, serendipity and vision in nanoscience”. From my point of
“Plasma ions create electronic defects in sensitive substrates as well as generate a large electronic trap density in deposited films, especially detrimental for gate dielectric applications.” This is a sentence that I read about 10 years ago (in January 2007
On 31 January 2018 more than 80 people from 11 different countries attended the event Advancing PV: from passivation to contacts – A passivating contact workshop. The interesting presentations of the invited speakers together with the extensive discussion with the audience
Note: This post can also be downloaded at the bottom of this page. Please cite as: M.F.J. Vos, A.J.M. Mackus, W.M.M. Kessels. Atomic Layer Deposition Process Development – 10 steps to successfully develop, optimize and characterize ALD recipes. 2019, 3.