On 31 January 2018 more than 80 people from 11 different countries attended the event Advancing PV: from passivation to contacts – A passivating contact workshop. The interesting presentations of the invited speakers together with the extensive discussion with the audience after each talk gave us a lot of food for thought, making this day a great success!
After the opening talk by Prof.dr. Wim Sinke (ECN / UvA) that put silicon PV technology development, including passivating contacts, in a new perspective, Dr. Lars Korte (HZB) gave a clear introduction on the physics and working principles of passivating contacts, e.g. by using the classical c-Si/a-Si:H heterojunction as a well-studied test case and metal-oxide based passivating contacts. The following speakers – Dr. Frank Feldmann (Fraunhofer ISE) and Dr. Mathieu Boccard (EPFL) – gave interesting, more in-depth talks on two very successful types of silicon-based passivating contact materials: polycrystalline silicon and thin film silicon.
After the lunch break that was combined with a lively poster session, Dr. Martin Bivour (Fraunhofer ISE) continued the program with his talk on passivating contacts based on metal oxides. Finally, Dr. Thomas Allen (KAUST) gave an in-depth presentation that covered electron-selective passivating contacts involving relatively new materials, such as Ca, metal fluorides and many others.
The slides of the presentations given by the various speakers and a selection of the presented posters can be downloaded here (after entering a password). An overview of the workshop and the program of the day can be viewed here.
Special thanks to Maria Mione for taking these pictures!