In the field of silicon solar cells, the search for more efficient and cost-effective technologies never ceases. One of the most exciting developments of the past decade has been the rise of so-called passivating contacts, with the current industry leader being TOPCon (Tunnel Oxide Passivated Contact) cells. I remember I was a PhD student when … Read more
It is more than 2 years ago that Elsa Alvaro (Northwestern University Libraries) and Angel Yanguas-Gil (Argonne National Laboratory) published their research article “Characterizing the field of Atomic Layer Deposition: Authors, topics, and collaborations” in PLOS ONE. This article provided some interesting insights into how the method of ALD evolved over time while the field … Read more
A new paper from our group has just appeared in Advanced Material Interfaces. In this paper I – together with my colleagues, have reviewed the methods explored to achieve uniform atomic layer deposition (ALD) on graphene. The work is part of my PhD project entitled: ‘A physical-analytical approach to atomic layer deposition of ultra-thin high-κ … Read more
Prof. Gregory Parsons (North Carolina State University) and Prof. Erwin Kessels (Eindhoven University of Technology) invite you to participate you in their short course on Atomic Layer Deposition (ALD), at the Eindhoven University of Technology on April 20, 2017. This course takes place in conjunction with the 2nd Area Selective Deposition workshop (ASD 2017), which … Read more
The recorded presentations of the 16th Atomic Layer Deposition Conference held in Dublin last July are now on YouTube! A list of all recorded presentations can be found on the ALD conference website. Below you can find a list of the contributions from our group in Eindhoven: Roozeboom, Fred: Tutorial on ALD/ALE Atomic Layer Processing for … Read more