A Closer Look at Tailored Waveform Biasing with an Industrial Generator – New “knobs” for precisely controlling ion energy in ALE and ALD
The continued evolution of semiconductor technology—as well as advances in emerging material platforms—places increasingly stringent demands on nanofabrication steps such as etching and deposition. Processes must not only enable atomic-scale thickness control, but also precise control over how surfaces are modified at the nanoscale. In this context, ion energy is becoming an increasingly important process … Read more