Highlights

In July 2022 we announced the research grant for the ‘Atomic Layer Deposition and Etching for Quantum Computing’ NWO project on AtomicLimits. This project focusing on atomic scale processing for superconducting quantum devices had a flying start in October 2022. One year later we can look back at a productive first year. It was a … Read more

This blog post is about a short perspective article that I recently wrote for the ILTPC newsletter. ILTPC stands for the International Low Temperature Plasma Community. It is one of the two main communities where I feel at home. The other one is the atomic scale processing community. This one is basically the atomic layer … Read more

I’m sure you have heard the buzz in the field of artificial intelligence (AI)… The promise of AI is to augment human abilities in areas such as decision-making, problem-solving, and other tasks. AI systems aim to simulate human intelligence and learn from data to improve their performance over time. ChatGPT is an AI language model … Read more

Quick link to open access paper: Applied Physics Reviews 9, 041313 (2022) Earlier this month I published my review paper entitled Atomic layer deposition of conductive and semiconductive oxides. It was an invited review for Applied Physics Reviews and I was very happy to see it picked as Featured article![1] In case you are not familiar … Read more

***Quick link to the open access paper: “Foundations of atomic-level plasma processing in nanoelectronics”*** We have just published a topical review paper entitled “Foundations of atomic-level plasma processing in nanoelectronics” in the journal Plasma Sources Science and Technology. This review is part of a two-part collection of papers on Foundations of Low Temperature Plasmas and … Read more

In late March, we launched our ReviewBase, a listing of atomic layer deposition (ALD) and atomic layer etching (ALE) review articles. The ReviewBase files available in Excel and PDF formats have been downloaded more than 500 times altogether in a little over two months. As the AtomicLimits site values open access to information, the ReviewBase … Read more

The scientific and technological interest in atomic layer deposition (ALD) and atomic layer etching (ALE) has been surging in the last decade and the sheer volume of ALD and ALE papers can make it difficult to get a clear overview of what is going on. Luckily, the studies and trends are often summarized and compared … Read more

The ability of atomic layer deposition (ALD) to grow highly conformal thin films is one of the main reasons why ALD is so popular in research and heavily employed in the semiconductor industry.1,2 This not only holds for thermally-driven ALD. As explained in a previous post, also plasma-assisted ALD can penetrate very deep into high-aspect-ratio … Read more

On May 1st, we kicked off our new research project entitled “Spatial Atomic Layer Deposition – More Materials, More Demanding Applications” , granted by the NWO Domain Applied and Engineering Sciences. As the title suggests, the project is geared at making more materials by spatial atomic layer deposition (S-ALD) for more demanding applications, of which … Read more

Plasmas can offer more than just etching straight down. This blog post aims to show that the etching community can benefit greatly from using plasmas for new applications. Currently, in the atomic layer etching (ALE) community plasmas are often considered only for anisotropic etching. In our recent work, which you can read or alternatively watch … Read more