My main teaching task at the Eindhoven University of Technology takes place in the fall when I teach the MSc course “Physics of Plasmas and Radiation”. This course is mandatory for all our MSc students in Applied Physics that follow the “Plasma & Beams” track (the other tracks within our department are “Nano, Quantum, Photonics” … Read more
In July 2022 we announced the research grant for the ‘Atomic Layer Deposition and Etching for Quantum Computing’ NWO project on AtomicLimits. This project focusing on atomic scale processing for superconducting quantum devices had a flying start in October 2022. One year later we can look back at a productive first year. It was a … Read more
This blog post is about a short perspective article that I recently wrote for the ILTPC newsletter. ILTPC stands for the International Low Temperature Plasma Community. It is one of the two main communities where I feel at home. The other one is the atomic scale processing community. This one is basically the atomic layer … Read more
I’m sure you have heard the buzz in the field of artificial intelligence (AI)… The promise of AI is to augment human abilities in areas such as decision-making, problem-solving, and other tasks. AI systems aim to simulate human intelligence and learn from data to improve their performance over time. ChatGPT is an AI language model … Read more
Quick link to open access paper: Applied Physics Reviews 9, 041313 (2022) Earlier this month I published my review paper entitled Atomic layer deposition of conductive and semiconductive oxides. It was an invited review for Applied Physics Reviews and I was very happy to see it picked as Featured article![1] In case you are not familiar … Read more
***Quick link to the open access paper: “Foundations of atomic-level plasma processing in nanoelectronics”*** We have just published a topical review paper entitled “Foundations of atomic-level plasma processing in nanoelectronics” in the journal Plasma Sources Science and Technology. This review is part of a two-part collection of papers on Foundations of Low Temperature Plasmas and … Read more
In late March, we launched our ReviewBase, a listing of atomic layer deposition (ALD) and atomic layer etching (ALE) review articles. The ReviewBase files available in Excel and PDF formats have been downloaded more than 500 times altogether in a little over two months. As the AtomicLimits site values open access to information, the ReviewBase … Read more
The scientific and technological interest in atomic layer deposition (ALD) and atomic layer etching (ALE) has been surging in the last decade and the sheer volume of ALD and ALE papers can make it difficult to get a clear overview of what is going on. Luckily, the studies and trends are often summarized and compared … Read more
The ability of atomic layer deposition (ALD) to grow highly conformal thin films is one of the main reasons why ALD is so popular in research and heavily employed in the semiconductor industry.1,2 This not only holds for thermally-driven ALD. As explained in a previous post, also plasma-assisted ALD can penetrate very deep into high-aspect-ratio … Read more
On May 1st, we kicked off our new research project entitled “Spatial Atomic Layer Deposition – More Materials, More Demanding Applications” , granted by the NWO Domain Applied and Engineering Sciences. As the title suggests, the project is geared at making more materials by spatial atomic layer deposition (S-ALD) for more demanding applications, of which … Read more