The recorded presentations of the 16th Atomic Layer Deposition Conference held in Dublin last July are now on YouTube!
A list of all recorded presentations can be found on the ALD conference website.
Below you can find a list of the contributions from our group in Eindhoven:
Roozeboom, Fred: Tutorial on ALD/ALE
Atomic Layer Processing for Future 3D IC Technologies
Creatore, Mariadriana
Opportunities and challenges for ALD in organo-metal halide perovskite solar cells
Faraz, Tahsin
ALD of high quality SiNx using DSBAS + N2 plasma on planar and 3D substrates
Karasulu, Bora
Functionalized Graphenes as Seeding Layers for Metal Oxide ALD: Insights from First-Principles Simulations
Karwal, Saurabh
Control of the conductivity in Hafnium Nitride thin films by plasma-assisted ALD: on the role of the feed gas composition and substrate biasing
Macco, Bart
ALD of very high-mobility In2O3:H using InCp, H2O, O2 and post-crystallization
Mackus, Adrie
ALD of ternary and quaternary nickel oxide-based films as catalysts for photoelectrochemical splitting of water
Mameli, Alfredo
Direct-write ALD of In2O3:H using a µ-plasma printer
Vandalon, Vincent
Initial growth of Al2O3 ALD studied with vibrational sum-frequency generation spectroscopy
Vos, Martijn
Thermal and plasma ALD on semiconductor nanowires
