Karsten Arts

I am a PhD candidate at the Eindhoven University of Technology, working in the Plasma and Materials Processing group. My research is focused on fundamental aspects of plasma-assisted ALD and thin film conformality.

Conformal deposition and gap-fill by plasma ALD – some great TEM images and recently published cover art

The ability of atomic layer deposition (ALD) to grow highly conformal thin films is one of the main reasons why ALD is so popular in research and heavily employed in the semiconductor industry.1,2 This not only holds for thermally-driven ALD. As explained in a previous post, also plasma-assisted ALD can penetrate very deep into high-aspect-ratio … Read more

Understanding plasma ALD – Why ions matter… and should be considered!

 [Note: a recording of my presentation for the 2020 Coburn and Winters Student Award competition can be viewed at the bottom of this page] This year I had the honor of being a finalist in the AVS Coburn and Winters Student Award competition, for my research on fundamental aspects of plasma-assisted atomic layer deposition (plasma … Read more

Basic insights into ALD conformality – A closer look at ALD and thin film conformality

Note: This post can also be downloaded at the bottom of this page. Please cite as: K. Arts, W.M.M. Kessels and H.C.M Knoops. Basic insights into ALD conformality – A closer look at ALD and thin film conformality. 2020, 1. AtomicLimits. Investigating the conformality of thin films grown by atomic layer deposition (ALD) is not … Read more

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