The ability of atomic layer deposition (ALD) to grow highly conformal thin films is one of the main reasons why ALD is so popular in research and heavily employed in the semiconductor industry.1,2 This not only holds for thermally-driven ALD.
Understanding plasma ALD – Why ions matter… and should be considered!
[Note: a recording of my presentation for the 2020 Coburn and Winters Student Award competition can be viewed at the bottom of this page] This year I had the honor of being a finalist in the AVS Coburn and Winters
Basic insights into ALD conformality – A closer look at ALD and thin film conformality
Note: This post can also be downloaded at the bottom of this page. Please cite as: K. Arts, W.M.M. Kessels and H.C.M Knoops. Basic insights into ALD conformality – A closer look at ALD and thin film conformality. 2020, 1.