Please cite as M.J.M. Merkx, A.J.M. Mackus, Area-selective ALD of diffusion barriers for via optimization – There is plenty of room at the bottom. 2022, 7. AtomicLimits. This week the 6th area-selective deposition (ASD) workshop will be held in San Francisco,
In 2019 we wrote a blog post on the use of area-selective deposition (ASD) for the fabrication of Fully Self-Aligned Via (FSAV) structures and how this application could enable further downscaling in the semiconductor industry.