Last November the method of atomic layer deposition (ALD) turned 45 years old. The date of November 29, 1974 was the priority date for the first patent in the field of ALD. I considered this a good occasion to share
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Basic insights into ALD conformality – A closer look at ALD and thin film conformality
Note: This post can also be downloaded at the bottom of this page. Please cite as: K. Arts, W.M.M. Kessels and H.C.M Knoops. Basic insights into ALD conformality – A closer look at ALD and thin film conformality. 2020, 1.
The ALD/Database: looking back on the first year
Introduction In March 2019 the ALD/Database was introduced to the ALD community on www.atomiclimits.com. The ALD/Database is an initiative by Harm Knoops, Bart Macco, Vincent Vandalon and Erwin Kessels and offers a centralized platform for the ALD community to provide
Atomic layer deposition turns 45! – The history of ALD in a timeline and an animated version of the ALD periodic table
Atomic layer deposition (ALD) has become a very popular method for the preparation of (ultra)thin films over the last two decades, yet it has a rich history which goes back many more years. It is well known that the first
Plasma ALD – A discussion of mechanisms – Commemorating the career of John Coburn
Undoubtedly, every scientist and technologist working in the field of plasma etching has heard about the research carried out by Coburn and Winters, two research scientists that worked at the IBM San Jose Research Laboratory for almost their full professional
What can Atomic Layer Deposition do for solar cells? – A few afterthoughts from my ALD conference tutorial
At the end of July the annual AVS International Conference on Atomic Layer Deposition (ALD) – combined with the Atomic Layer Etching (ALE) Workshop – took place in Bellevue, Seattle. As customary, the Sunday before the conference itself was devoted to
#ALDALE2019: the aftermath… including photos!
The photos in this blog post were made by DIWAS Photography, Seattle Event Photographer Two weeks ago the 19th International Conference on Atomic Layer Deposition, featuring also the 6th International Atomic Layer Etching Workshop, took place in Bellevue, WA. As
Here we go again… the online ALE database! – A website where you can easily search, find, and add ALE processes
It might not be fully unexpected but after launching our online ALD database a few months ago, but now we have now also put together an online database on Atomic Layer Etching (ALE). So here it is! Similar to the
#ALDALE2019 – A preview of my “ALD Innovator Award” plenary presentation at the 19th International Conference on Atomic Layer Deposition
The 19th International Conference on Atomic Layer Deposition, featuring also the 6th International Atomic Layer Etching Workshop, is about to start. It will kick-off today (Sunday July 22) with a tutorial session and the welcome reception. I feel extremely honored
Fully self-aligned vias: the killer application for area-selective ALD? – A discussion of the requirements for implementation in high volume manufacturing
Please cite as: A.J.M. Mackus, M.J.M. Merkx. Fully Self-Aligned Vias: The Killer Application for Area-Selective ALD? – A Discussion of the Requirements for Implementation in High Volume Manufacturing. 2019, 7. AtomicLimits. Recently, the 4th Area Selective Deposition workshop (ASD2019) took