Fitting to the contents of this post on collaboration, this post will appear both on Atomic Limits and on the Oxford Instruments Plasma Technology blog. What defines a truly successful collaboration? It has to be something where the whole is

Recently, the art of processing materials in a selective manner has garnered significant attention. Especially in the past few years, the topic of making atomic scale processing techniques, such as atomic layer deposition (ALD) and atomic layer etching (ALE), more

We just published a perspective article entitled “From the bottom-up: towards area-selective atomic layer deposition with high selectivity”.1 This perspective describes the current status of the field of area-selective atomic layer deposition (ALD), and also includes my vision on how

When evaluating what comes out of a university research group, often the research carried out by the group is given most attention. However, obviously, the most important product of a research group is not the research itself but it’s the