A new flavor of ALE – What plasmas can bring to isotropic etching (a radical approach)
Plasmas can offer more than just etching straight down. This blog post aims to show that the etching community can benefit greatly from using plasmas for new applications. Currently, in the atomic layer etching (ALE) community plasmas are often considered only for anisotropic etching. In our recent work, which you can read or alternatively watch … Read more