Miika Mattinen

I am a postdoc at Eindhoven University of Technology working on plasma-enhanced atomic layer deposition (PEALD) of 2D materials. I have been doing research on ALD since 2014 with PhD (2020) and MSc (2015) degrees from University of Helsinki. I have covered wide range of materials (in particular sulfides, but also oxides, selenides, metals...) and applications (electronics, optoelectronics, sensors, electrocatalysis...) and I am enthusiastic to expand my ALD knowledge fruther.

Update of the Atomic Scale Processing ReviewBase – Easy-to-access overview of ALD and ALE reviews (extended), ASD reviews (new) and ALD book chapters (new)

In late March, we launched our ReviewBase, a listing of atomic layer deposition (ALD) and atomic layer etching (ALE) review articles. The ReviewBase files available in Excel and PDF formats have been downloaded more than 500 times altogether in a little over two months. As the AtomicLimits site values open access to information, the ReviewBase … Read more

Launch of the ALD & ALE ReviewBase – An easy-to-access overview of all ALD and ALE review papers

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The scientific and technological interest in atomic layer deposition (ALD) and atomic layer etching (ALE) has been surging in the last decade and the sheer volume of ALD and ALE papers can make it difficult to get a clear overview of what is going on. Luckily, the studies and trends are often summarized and compared … Read more

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