Recently, the Plasma and Materials Processing (PMP) group at the TU/e hosted de AI workshop, a company founded by four students that aims to educate and train people about using Artificial Intelligence (AI) for their work, especially ChatGPT 4. The
Introducing the new AtomicLimits ReviewBase – New features, new design and more to come!
We are very excited to announce the release of the totally renewed ReviewBase, which you can find in the menu above. We launched the original ReviewBase in 2022 as an easy-to-access overview of ALD, ALE and ASD review papers and
The Significance of Plasma Physics in EUV Lithography – Teaching ASML employees my Introduction to Plasma Physics course
My main teaching task at the Eindhoven University of Technology takes place in the fall when I teach the MSc course “Physics of Plasmas and Radiation”. This course is mandatory for all our MSc students in Applied Physics that follow
Substrate biasing as a tuning knob for superconducting films – the “ALD and ALE for quantum project” celebrates its first year with a publication
In July 2022 we announced the research grant for the ‘Atomic Layer Deposition and Etching for Quantum Computing’ NWO project on AtomicLimits. This project focusing on atomic scale processing for superconducting quantum devices had a flying start in October 2022.
After enabling AI it is time for the plasma community to benefit from AI – Personal view in a short perspective article
This blog post is about a short perspective article that I recently wrote for the ILTPC newsletter. ILTPC stands for the International Low Temperature Plasma Community. It is one of the two main communities where I feel at home. The
Let’s chat GPC by chatGPT – Putting ChatGPT to the test and a first (?) article about ALD by AI
I’m sure you have heard the buzz in the field of artificial intelligence (AI)… The promise of AI is to augment human abilities in areas such as decision-making, problem-solving, and other tasks. AI systems aim to simulate human intelligence and
A review on Atomic Layer Deposition of (semi)conductive oxides – The role of ALD in these emerging materials and their applications
Quick link to open access paper: Applied Physics Reviews 9, 041313 (2022) Earlier this month I published my review paper entitled Atomic layer deposition of conductive and semiconductive oxides. It was an invited review for Applied Physics Reviews and I was
Foundations of atomic-level plasma processing in nanoelectronics – Smaller, thinner, taller, etc … all enabled by plasmas
***Quick link to the open access paper: “Foundations of atomic-level plasma processing in nanoelectronics”*** We have just published a topical review paper entitled “Foundations of atomic-level plasma processing in nanoelectronics” in the journal Plasma Sources Science and Technology. This review
Update of the Atomic Scale Processing ReviewBase – Easy-to-access overview of ALD and ALE reviews (extended), ASD reviews (new) and ALD book chapters (new)
In late March, we launched our ReviewBase, a listing of atomic layer deposition (ALD) and atomic layer etching (ALE) review articles. The ReviewBase files available in Excel and PDF formats have been downloaded more than 500 times altogether in a
Launch of the ALD & ALE ReviewBase – An easy-to-access overview of all ALD and ALE review papers
The scientific and technological interest in atomic layer deposition (ALD) and atomic layer etching (ALE) has been surging in the last decade and the sheer volume of ALD and ALE papers can make it difficult to get a clear overview