Atomic Layer Deposition Process Development 2.0 — An updated 10-step workflow for systematically developing, optimizing and characterizing ALD processes
Developing a reliable atomic layer deposition (ALD) process involves much more than finding conditions that produce a film. The reactants must be selected carefully, the self-limiting nature of the surface reactions must be demonstrated, and the composition, material properties, uniformity, nucleation and conformality of the film must be assessed. Eventually, the process should also be … Read more