A little over a month ago, we proudly hosted the second edition of Spatial ALD Day in Eindhoven. After our first edition in 2022, we were thrilled to finally bring the community together again! Spatial ALD Day 2.0 was organized in the framework of the NWO OTP project on spatial ALD and the EU Pepperoni … Read more
Registration closed Register now for the second edition of the Spatial ALD Day, which will take place on Tuesday, October 28, 2025! This event follows the highly successful first Spatial ALD Day in 2022. Now, we look forward to bringing the community together once again for a day of insightful discussions, technical deep dives, and … Read more
At the end of June (June 22–25, 2025), the ALD/ALE 2025 conference took place in Jeju, South Korea. The conference combines the International Conference on Atomic Layer Deposition (25th edition this year) with the Atomic Layer Etching Workshop (12th edition). Last year we celebrated the 50th anniversary of ALD in Helsinki, and I wrote a … Read more
Earlier, I wrote a blog post about the significance of plasma physics in EUV lithography and how ASML recognizes its importance—so much that ASML has a portion of their “Research” and “Development & Engineering” staff receive training in elementary plasma physics, in addition to the substantial number of plasma physicists they have directly hired. That … Read more
On the 20th of May, the atomic layer deposition and etching for quantum technologies workshop took place at the Eindhoven University of Technology. The event was a great success—if we may say so ourselves—and sparked valuable exchanges between the ALD/ALE and quantum communities. In this blog post, we reflect on the day and highlight the … Read more
As a prelude to our upcoming workshop on atomic layer deposition and etching for quantum technologies, we share our vision in this blog post about how ALD and ALE can help propel quantum technologies forward. Also, a detailed program and the registration link for the workshop are available at the end of this post. We … Read more
This is a blogpost initiated by our sponsor Chipmetrics The rapid advancement of nanoelectronics is driving the transition to 3D vertical scaling, requiring ultra-thin, highly conformal films to be deposited within high-aspect ratio (HAR) structures. As these technological advances push boundaries, precise thin-film metrology becomes paramount. Chipmetrics is leading the charge with its innovative Lateral … Read more
We are excited to announce the second edition of the Spatial ALD Day, which will take place on Tuesday, October 28, 2025! This event follows the highly successful first Spatial ALD Day we organized at the start of our NWO OTP project on spatial ALD. As our project now nears its conclusion, we look forward … Read more
On the 20th of May 2025, a full day event will be organized at the Eindhoven University of Technology focusing on the opportunities that atomic layer deposition (ALD) and atomic layer etching (ALE) provide for quantum technologies. A preliminary program is available below, featuring established speakers from industry and academia. The workshop takes place on-site … Read more
In the field of silicon solar cells, the search for more efficient and cost-effective technologies never ceases. One of the most exciting developments of the past decade has been the rise of so-called passivating contacts, with the current industry leader being TOPCon (Tunnel Oxide Passivated Contact) cells. I remember I was a PhD student when … Read more