Schematic illustration of how (a) convential patterning leads to edge placement errors, (b) area-selective ALD can be employed for self-aligned processing. Mackus et al., Chem. Mater. 2019, 31, 2−12
I'm a postdoctoral researcher at the Eindhoven University of Technology with a passion for crystalline silicon photovoltaics. I have a strong affinity with the preparation and analysis of functional thin films for such cells, with special focus on transparent conductive oxides. Moreover, I'm the person managing this blog! Hope you like it!