Schematic illustration of how (a) convential patterning leads to edge placement errors, (b) area-selective ALD can be employed for self-aligned processing. Mackus et al., Chem. Mater. 2019, 31, 2−12
Schematic illustration of how (a) convential patterning leads to edge placement errors, (b) area-selective ALD can be employed for self-aligned processing. Mackus et al., Chem. Mater. 2019, 31, 2−12