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ALD MoOx In2O3H hole-selective contact

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ALD MoOx - In2O3:H hole-selective contact

Bart Macco, adapted from "Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells", Phys. Status Solidi – Rapid Res. Lett. 9 (2015) 393–396. DOI: 10.1002/pssr.201510117.

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Bart Macco

I'm an assistant professor at the Eindhoven University of Technology with a passion for atomic-scale processing of semiconductor nanolayers. Moreover, I'm the person managing this blog! Hope you like it!

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