Self-aligned quadruple patterning

Harm Knoops, Status and prospects of plasma-assisted atomic layer deposition, JVSTA, 37, 030902 (2019), DOI: 10.1116/1.5088582

About Author

Bart Macco

I'm an assistant professor at the Eindhoven University of Technology with a passion for atomic-scale processing of semiconductor nanolayers. Moreover, I'm the person managing this blog! Hope you like it!

About Author

Bart Macco

Leave a Reply