Plasma ALD of SiO₂: film conformality and influence of ions

Karsten Arts, images (left) adapted from J. Phys. Chem. C 123, 27030–27035 (2019). DOI: 10.1021/acs.jpcc.9b08176 and data (right) adapted from Appl. Phys. Lett. 117, 031602 (2020). DOI: 10.1063/5.0015379

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Bart Macco

I'm a postdoctoral researcher at the Eindhoven University of Technology with a passion for crystalline silicon photovoltaics. I have a strong affinity with the preparation and analysis of functional thin films for such cells, with special focus on transparent conductive oxides. Moreover, I'm the person managing this blog! Hope you like it!

About Author

Bart Macco

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