A new paper from our group has just appeared in Advanced Material Interfaces. In this paper I – together with my colleagues, have reviewed the methods explored to achieve uniform atomic layer deposition (ALD) on graphene. The work is part
ALD of high-quality hydrogen-doped indium oxide
– a mini-review
I recently successfully defended my PhD thesis, entitled “Atomic Layer Deposition of Metal Oxide Thin Films for Si Heterojunction Solar Cells”. As the title suggests, I have worked on ALD of various metal oxides for the application in Si heterojunction